{"version":"1.0","provider_name":"MicroDevice Prototyping Facility","provider_url":"https:\/\/sciences.ucf.edu\/physics\/mpf","author_name":"College of Sciences","author_url":"https:\/\/sciences.ucf.edu\/physics\/mpf\/author\/coswebadmin\/","title":"Dry Etching - MicroDevice Prototyping Facility","type":"rich","width":600,"height":338,"html":"<blockquote class=\"wp-embedded-content\" data-secret=\"T9Nl0eU8bk\"><a href=\"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/\">Dry Etching<\/a><\/blockquote><iframe sandbox=\"allow-scripts\" security=\"restricted\" src=\"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/embed\/#?secret=T9Nl0eU8bk\" width=\"600\" height=\"338\" title=\"&#8220;Dry Etching&#8221; &#8212; MicroDevice Prototyping Facility\" data-secret=\"T9Nl0eU8bk\" frameborder=\"0\" marginwidth=\"0\" marginheight=\"0\" scrolling=\"no\" class=\"wp-embedded-content\"><\/iframe><script>\n\/*! This file is auto-generated *\/\n!function(d,l){\"use strict\";l.querySelector&&d.addEventListener&&\"undefined\"!=typeof URL&&(d.wp=d.wp||{},d.wp.receiveEmbedMessage||(d.wp.receiveEmbedMessage=function(e){var t=e.data;if((t||t.secret||t.message||t.value)&&!\/[^a-zA-Z0-9]\/.test(t.secret)){for(var s,r,n,a=l.querySelectorAll('iframe[data-secret=\"'+t.secret+'\"]'),o=l.querySelectorAll('blockquote[data-secret=\"'+t.secret+'\"]'),c=new RegExp(\"^https?:$\",\"i\"),i=0;i<o.length;i++)o[i].style.display=\"none\";for(i=0;i<a.length;i++)s=a[i],e.source===s.contentWindow&&(s.removeAttribute(\"style\"),\"height\"===t.message?(1e3<(r=parseInt(t.value,10))?r=1e3:~~r<200&&(r=200),s.height=r):\"link\"===t.message&&(r=new URL(s.getAttribute(\"src\")),n=new URL(t.value),c.test(n.protocol))&&n.host===r.host&&l.activeElement===s&&(d.top.location.href=t.value))}},d.addEventListener(\"message\",d.wp.receiveEmbedMessage,!1),l.addEventListener(\"DOMContentLoaded\",function(){for(var e,t,s=l.querySelectorAll(\"iframe.wp-embedded-content\"),r=0;r<s.length;r++)(t=(e=s[r]).getAttribute(\"data-secret\"))||(t=Math.random().toString(36).substring(2,12),e.src+=\"#?secret=\"+t,e.setAttribute(\"data-secret\",t)),e.contentWindow.postMessage({message:\"ready\",secret:t},\"*\")},!1)))}(window,document);\n\/\/# sourceURL=https:\/\/sciences.ucf.edu\/physics\/mpf\/wp-includes\/js\/wp-embed.min.js\n<\/script>\n","description":"Barrel Asher Branson\/IPCStandard Operating Procedure Description: Low Temperature Isotropic Etcher Features: 13.56 MHz RF Generator 500 W maxQuartz process chamber 10&#8243; dia. x 20&#8243; deepSupported Gasses: CF4\u00a0&amp; O2Base Pressure: 60 mTorr Reactive Ion Etcher Samco RIE-1CStandard Operating Procedure Description: N\/A Features: Operating Requency: 13.56 MHzMaximum Power: 200 WattsSupported gases: CF4, Ar, O2, H2 Reactive Ion ... Read more","thumbnail_url":"http:\/\/sciences.ucf.edu\/physics\/mpf\/wp-content\/uploads\/sites\/48\/2023\/11\/barrelasher_cc.png"}