{"id":132,"date":"2023-11-09T11:38:02","date_gmt":"2023-11-09T16:38:02","guid":{"rendered":"https:\/\/sciences.ucf.edu\/physics\/mpf\/?page_id=132"},"modified":"2023-11-09T11:38:27","modified_gmt":"2023-11-09T16:38:27","slug":"dry-etching","status":"publish","type":"page","link":"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/","title":{"rendered":"Dry Etching"},"content":{"rendered":"\n

Barrel Asher<\/h2>\n\n\n\n
\"Barrel<\/figure>
\n

Branson\/IPC
Standard Operating Procedure<\/a><\/p>\n\n\n\n

Description:<\/h3>\n\n\n\n

Low Temperature Isotropic Etcher<\/p>\n\n\n\n

Features:<\/h3>\n\n\n\n

13.56 MHz RF Generator 500 W max
Quartz process chamber 10″ dia. x 20″ deep
Supported Gasses: CF4<\/sub>\u00a0& O2<\/sub>
Base Pressure: 60 mTorr<\/p>\n<\/div><\/div>\n\n\n\n

\n\n\n\n

Reactive Ion Etcher<\/h2>\n\n\n\n
\"Samco<\/figure>
\n

Samco RIE-1C
Standard Operating Procedure<\/a><\/p>\n\n\n\n

Description:<\/h3>\n\n\n\n

N\/A<\/p>\n\n\n\n

Features:<\/h3>\n\n\n\n

Operating Requency: 13.56 MHz
Maximum Power: 200 Watts
Supported gases: CF4<\/sub>, Ar, O2<\/sub>, H2<\/sub><\/p>\n<\/div><\/div>\n\n\n\n

\n\n\n\n

Reactive Ion Etcher with Inductively Coupled Plasma<\/h2>\n\n\n\n
\"\"<\/figure>
\n

Trion MiniLock II RIE-ICP
Standard Operating Procedure<\/a><\/p>\n\n\n\n

Description:<\/h3>\n\n\n\n

For parallel mask alignment and UV photoresist removal.<\/p>\n\n\n\n

Features:<\/h3>\n\n\n\n

He substrate cooling
Supported gasses: O2<\/sub>,CF4<\/sub>,Ar, H2<\/sub>,CH4<\/sub>
Water cooled RF
600 W
13.56 MHz
Labview interface
Load Lock<\/p>\n<\/div><\/div>\n\n\n\n

\n\n\n\n

Deep Reactive Ion Etching<\/h2>\n\n\n\n
\"STS<\/figure>
\n

STS<\/p>\n\n\n\n

Description:<\/h3>\n\n\n\n

N\/A<\/p>\n\n\n\n

Features:<\/h3>\n\n\n\n

Inductively Coupled Plasma Processes
Unit with load lock
Bosch Process
Supported gasses: SF6<\/sub>, C4<\/sub>F8<\/sub>, Ar, O2<\/sub>, CF4<\/sub><\/p>\n<\/div><\/div>\n","protected":false},"excerpt":{"rendered":"

Barrel Asher Branson\/IPCStandard Operating Procedure Description: Low Temperature Isotropic Etcher Features: 13.56 MHz RF Generator 500 W maxQuartz process chamber 10″ dia. x 20″ deepSupported Gasses: CF4\u00a0& O2Base Pressure: 60 mTorr Reactive Ion Etcher Samco RIE-1CStandard Operating Procedure Description: N\/A Features: Operating Requency: 13.56 MHzMaximum Power: 200 WattsSupported gases: CF4, Ar, O2, H2 Reactive Ion … Read more<\/a><\/p>\n","protected":false},"author":3,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"_eb_attr":"","footnotes":"","_links_to":"","_links_to_target":""},"class_list":["post-132","page","type-page","status-publish"],"yoast_head":"\nDry Etching - MicroDevice Prototyping Facility<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Dry Etching - MicroDevice Prototyping Facility\" \/>\n<meta property=\"og:description\" content=\"Barrel Asher Branson\/IPCStandard Operating Procedure Description: Low Temperature Isotropic Etcher Features: 13.56 MHz RF Generator 500 W maxQuartz process chamber 10″ dia. x 20″ deepSupported Gasses: CF4\u00a0& O2Base Pressure: 60 mTorr Reactive Ion Etcher Samco RIE-1CStandard Operating Procedure Description: N\/A Features: Operating Requency: 13.56 MHzMaximum Power: 200 WattsSupported gases: CF4, Ar, O2, H2 Reactive Ion ... Read more\" \/>\n<meta property=\"og:url\" content=\"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/\" \/>\n<meta property=\"og:site_name\" content=\"MicroDevice Prototyping Facility\" \/>\n<meta property=\"article:modified_time\" content=\"2023-11-09T16:38:27+00:00\" \/>\n<meta property=\"og:image\" content=\"http:\/\/sciences.ucf.edu\/physics\/mpf\/wp-content\/uploads\/sites\/48\/2023\/11\/barrelasher_cc.png\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:label1\" content=\"Est. reading time\" \/>\n\t<meta name=\"twitter:data1\" content=\"2 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/\",\"url\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/\",\"name\":\"Dry Etching - MicroDevice Prototyping Facility\",\"isPartOf\":{\"@id\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/#primaryimage\"},\"image\":{\"@id\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/#primaryimage\"},\"thumbnailUrl\":\"http:\/\/sciences.ucf.edu\/physics\/mpf\/wp-content\/uploads\/sites\/48\/2023\/11\/barrelasher_cc.png\",\"datePublished\":\"2023-11-09T16:38:02+00:00\",\"dateModified\":\"2023-11-09T16:38:27+00:00\",\"breadcrumb\":{\"@id\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/#breadcrumb\"},\"inLanguage\":\"en-US\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"en-US\",\"@id\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/#primaryimage\",\"url\":\"http:\/\/sciences.ucf.edu\/physics\/mpf\/wp-content\/uploads\/sites\/48\/2023\/11\/barrelasher_cc.png\",\"contentUrl\":\"http:\/\/sciences.ucf.edu\/physics\/mpf\/wp-content\/uploads\/sites\/48\/2023\/11\/barrelasher_cc.png\"},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Dry Etching\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/#website\",\"url\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/\",\"name\":\"MicroDevice Prototyping Facility\",\"description\":\"\",\"publisher\":{\"@id\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/#organization\"},\"potentialAction\":[{\"@type\":\"SearchAction\",\"target\":{\"@type\":\"EntryPoint\",\"urlTemplate\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/?s={search_term_string}\"},\"query-input\":{\"@type\":\"PropertyValueSpecification\",\"valueRequired\":true,\"valueName\":\"search_term_string\"}}],\"inLanguage\":\"en-US\"},{\"@type\":\"Organization\",\"@id\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/#organization\",\"name\":\"MicroDevice Prototyping Facility\",\"url\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/\",\"logo\":{\"@type\":\"ImageObject\",\"inLanguage\":\"en-US\",\"@id\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/#\/schema\/logo\/image\/\",\"url\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/wp-content\/uploads\/sites\/48\/2023\/11\/MPF-Logo.png\",\"contentUrl\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/wp-content\/uploads\/sites\/48\/2023\/11\/MPF-Logo.png\",\"width\":220,\"height\":120,\"caption\":\"MicroDevice Prototyping Facility\"},\"image\":{\"@id\":\"https:\/\/sciences.ucf.edu\/physics\/mpf\/#\/schema\/logo\/image\/\"}}]}<\/script>\n<!-- \/ Yoast SEO plugin. -->","yoast_head_json":{"title":"Dry Etching - MicroDevice Prototyping Facility","robots":{"index":"index","follow":"follow","max-snippet":"max-snippet:-1","max-image-preview":"max-image-preview:large","max-video-preview":"max-video-preview:-1"},"canonical":"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/","og_locale":"en_US","og_type":"article","og_title":"Dry Etching - MicroDevice Prototyping Facility","og_description":"Barrel Asher Branson\/IPCStandard Operating Procedure Description: Low Temperature Isotropic Etcher Features: 13.56 MHz RF Generator 500 W maxQuartz process chamber 10″ dia. x 20″ deepSupported Gasses: CF4\u00a0& O2Base Pressure: 60 mTorr Reactive Ion Etcher Samco RIE-1CStandard Operating Procedure Description: N\/A Features: Operating Requency: 13.56 MHzMaximum Power: 200 WattsSupported gases: CF4, Ar, O2, H2 Reactive Ion ... Read more","og_url":"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/","og_site_name":"MicroDevice Prototyping Facility","article_modified_time":"2023-11-09T16:38:27+00:00","og_image":[{"url":"http:\/\/sciences.ucf.edu\/physics\/mpf\/wp-content\/uploads\/sites\/48\/2023\/11\/barrelasher_cc.png","type":"","width":"","height":""}],"twitter_card":"summary_large_image","twitter_misc":{"Est. reading time":"2 minutes"},"schema":{"@context":"https:\/\/schema.org","@graph":[{"@type":"WebPage","@id":"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/","url":"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/","name":"Dry Etching - MicroDevice Prototyping Facility","isPartOf":{"@id":"https:\/\/sciences.ucf.edu\/physics\/mpf\/#website"},"primaryImageOfPage":{"@id":"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/#primaryimage"},"image":{"@id":"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/#primaryimage"},"thumbnailUrl":"http:\/\/sciences.ucf.edu\/physics\/mpf\/wp-content\/uploads\/sites\/48\/2023\/11\/barrelasher_cc.png","datePublished":"2023-11-09T16:38:02+00:00","dateModified":"2023-11-09T16:38:27+00:00","breadcrumb":{"@id":"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/#breadcrumb"},"inLanguage":"en-US","potentialAction":[{"@type":"ReadAction","target":["https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/"]}]},{"@type":"ImageObject","inLanguage":"en-US","@id":"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/#primaryimage","url":"http:\/\/sciences.ucf.edu\/physics\/mpf\/wp-content\/uploads\/sites\/48\/2023\/11\/barrelasher_cc.png","contentUrl":"http:\/\/sciences.ucf.edu\/physics\/mpf\/wp-content\/uploads\/sites\/48\/2023\/11\/barrelasher_cc.png"},{"@type":"BreadcrumbList","@id":"https:\/\/sciences.ucf.edu\/physics\/mpf\/dry-etching\/#breadcrumb","itemListElement":[{"@type":"ListItem","position":1,"name":"Home","item":"https:\/\/sciences.ucf.edu\/physics\/mpf\/"},{"@type":"ListItem","position":2,"name":"Dry Etching"}]},{"@type":"WebSite","@id":"https:\/\/sciences.ucf.edu\/physics\/mpf\/#website","url":"https:\/\/sciences.ucf.edu\/physics\/mpf\/","name":"MicroDevice Prototyping Facility","description":"","publisher":{"@id":"https:\/\/sciences.ucf.edu\/physics\/mpf\/#organization"},"potentialAction":[{"@type":"SearchAction","target":{"@type":"EntryPoint","urlTemplate":"https:\/\/sciences.ucf.edu\/physics\/mpf\/?s={search_term_string}"},"query-input":{"@type":"PropertyValueSpecification","valueRequired":true,"valueName":"search_term_string"}}],"inLanguage":"en-US"},{"@type":"Organization","@id":"https:\/\/sciences.ucf.edu\/physics\/mpf\/#organization","name":"MicroDevice Prototyping Facility","url":"https:\/\/sciences.ucf.edu\/physics\/mpf\/","logo":{"@type":"ImageObject","inLanguage":"en-US","@id":"https:\/\/sciences.ucf.edu\/physics\/mpf\/#\/schema\/logo\/image\/","url":"https:\/\/sciences.ucf.edu\/physics\/mpf\/wp-content\/uploads\/sites\/48\/2023\/11\/MPF-Logo.png","contentUrl":"https:\/\/sciences.ucf.edu\/physics\/mpf\/wp-content\/uploads\/sites\/48\/2023\/11\/MPF-Logo.png","width":220,"height":120,"caption":"MicroDevice Prototyping Facility"},"image":{"@id":"https:\/\/sciences.ucf.edu\/physics\/mpf\/#\/schema\/logo\/image\/"}}]}},"_links":{"self":[{"href":"https:\/\/sciences.ucf.edu\/physics\/mpf\/wp-json\/wp\/v2\/pages\/132","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/sciences.ucf.edu\/physics\/mpf\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/sciences.ucf.edu\/physics\/mpf\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/sciences.ucf.edu\/physics\/mpf\/wp-json\/wp\/v2\/users\/3"}],"replies":[{"embeddable":true,"href":"https:\/\/sciences.ucf.edu\/physics\/mpf\/wp-json\/wp\/v2\/comments?post=132"}],"version-history":[{"count":1,"href":"https:\/\/sciences.ucf.edu\/physics\/mpf\/wp-json\/wp\/v2\/pages\/132\/revisions"}],"predecessor-version":[{"id":134,"href":"https:\/\/sciences.ucf.edu\/physics\/mpf\/wp-json\/wp\/v2\/pages\/132\/revisions\/134"}],"wp:attachment":[{"href":"https:\/\/sciences.ucf.edu\/physics\/mpf\/wp-json\/wp\/v2\/media?parent=132"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}