Photolithography

Headway Spin Coater

Headway PWM32-PS-R790
Standard Operating Procedure

Description:

Used for evenly coating a substrate with photoresist.

Features:

Programmable Controller
10,000 RPM Motor
15″ Diameter Steel Bowl
Vacuum chuck
Vacuum On/ Off Valve


Hot Plate

VWR(R) Standard

Description:

N/A

Features:

4″x4″ (10.2 x 10.2 cm) aluminum top
Digital display 5 °C (above RT) to 400 °C
Adjustable in 1 °C increments
Beeps at Set point


OAI Mask Aligner

OAI Series 200
Standard Operating Procedure

Description:

For parallel mask alignment and UV photoresist removal.

Features:

5″ Masks
Up to 4″ Wafers
5x, 10x, and 2x objectives
Nominal 1 µm Resolution
2 µm Accuracy
Vacuum contact
Hard Contact