Materials Growth

Plasma Enchaned Chemical Vapor Deposition

Trion Orion II PECVD

Trion Orion II PECVD
Standard Operating Procedure

Description:

N/A

Features:

Oxide Deposition w/ TEOS He bubbler unit
Dual Frequency RF: 600W @13.56MHz & 100kHz
Substrate Temperature controlled: RT-500°C
Base Pressure: 60 mTorr
Supported gasses: CF4, O2, He (TEOS), N2