Dr. Schelling received his PhD in Physics from University of Minnesota, Minneapolis, in 1999. He spent two years (1999-2001) as a Postdoctoral Researcher and two years (2001-2003) as a Visiting Scientist in Argonne National Laboratory, Argonne, IL before joining UCF in 2003 where he is an Associate Professor. He works in computational modeling of electron, mass, and heat transport in materials. He also computation to elucidate interactions and dissipation at interfaces with applications in materials science and planetary science.


  1. B. D. Doan and P. K. Schelling, “Dissipation and adhesion hysteresis between (010) forsterite surfaces using molecular-dynamics simulation and the Jarzynski equality,” Comp. Mat. Sci. 206, 111259 (2022)
  2. W. E. Richardson, E. R. Mucciolo, and P. K. Schelling, “Resistivity size effect due to surface steps on ruthenium thin films computed with a realistic tight-binding model,” Journal of Applied Physics 130, 195108 (2021)
  3. B. Doan, A. R. Dove, and P. K. Schelling, “Dissipation and adhesion between amorphous FeO nanoparticles,” J.  Aero. Sci. 155, 105742 (2021)
  4. K. Barmak, S. Ezzat, R. Gusley, A. Jog, S. Kerdsongpanya, A. Khanya, E. Milosevic, W. Richardson, K. Sentosun, A. Zangiabadi, D. Gall, W. E. Kaden, E. R. Mucciolo, P. K. Schelling, A. C. West, and K. R. Coffey, “Epitaxial metals for interconnects beyond Cu”, J. Vac. Sci. Tech. A 38, 033406 (2020)
  5. K. Fernando and P. K. Schelling, “Non-local linear-response functions for thermal transport computed with equilibrium molecular-dynamics simulation,” J. Appl. Phys. 128, 215105 (2020)